| 摘要 |
PROBLEM TO BE SOLVED: To provide a polyimide precursor developable with an aqueous alkali solution and having negative type pattern forming ability, and a method of stably producing the polyimide precursor. SOLUTION: The photosensitive resin composition comprises (A) the polyimide precursor having organic groups R3 and R4 each having a styrylpyridinium salt skeleton or a styryldiazinium skeleton as shown by formulae, (B) a dehydration condensing agent used in the synthesis of the polyimide precursor, e.g. diphenyl(2,3-dihydro-2-thioxo-3-bezoxazole)phosphonate, (C) a photopolymerization initiator, a sensitizer or an inhibitor for imparting shelf stability and (D) a solvent containing a photosensitive agent. |
