发明名称 BIPOLAR TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a dipolar transistor which has a high breakdown strength characteristic, which prevents the generation of a leakage current by movable ions, which prevents the degradation of an electric characteristic due to a thermal strain and which is of high reliability. SOLUTION: The bipolar transistor comprises a structure in which a base layer of a second conductivity type is sandwiched between an emitter layer and a collector layer of a first conductivity type. The base layer is composed mainly of SiGe which contains Ge in a desired amount. An exposed face which comprises at least the boundary interface between the base layer and the collector layer is covered with a coating member which is composed of gel-like or rubber-like silicone.
申请公布号 JP2001217256(A) 申请公布日期 2001.08.10
申请号 JP20000025428 申请日期 2000.02.02
申请人 MITSUBISHI HEAVY IND LTD;SANSHA ELECTRIC MFG CO LTD 发明人 HIROSE FUMIHIKO;SODA YUTAKA
分类号 H01L29/73;H01L21/28;H01L21/331;H01L29/165;H01L29/43;(IPC1-7):H01L21/331 主分类号 H01L29/73
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