发明名称 |
BIPOLAR TRANSISTOR AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a dipolar transistor which has a high breakdown strength characteristic, which prevents the generation of a leakage current by movable ions, which prevents the degradation of an electric characteristic due to a thermal strain and which is of high reliability. SOLUTION: The bipolar transistor comprises a structure in which a base layer of a second conductivity type is sandwiched between an emitter layer and a collector layer of a first conductivity type. The base layer is composed mainly of SiGe which contains Ge in a desired amount. An exposed face which comprises at least the boundary interface between the base layer and the collector layer is covered with a coating member which is composed of gel-like or rubber-like silicone.
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申请公布号 |
JP2001217256(A) |
申请公布日期 |
2001.08.10 |
申请号 |
JP20000025428 |
申请日期 |
2000.02.02 |
申请人 |
MITSUBISHI HEAVY IND LTD;SANSHA ELECTRIC MFG CO LTD |
发明人 |
HIROSE FUMIHIKO;SODA YUTAKA |
分类号 |
H01L29/73;H01L21/28;H01L21/331;H01L29/165;H01L29/43;(IPC1-7):H01L21/331 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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