发明名称 METHOD OF MANUFACTURING A COMPOSITE STRUCTURE FOR USE IN ELECTRONIC DEVICE AND STRUCTURE MANUFACTURED BY SAID METHOD
摘要 A method for manufacturing of a composite microelectronic structure with improved planarity of layers thereof. The method comprises masking of selected portion of electrically conductive layers with subsequent selective electrochemical anodic oxidation thereof and removing the mask. A composite structure, in particular MCM-D's manufactured by this method has improved connectivity density and performances.
申请公布号 IL110431(A) 申请公布日期 2001.08.08
申请号 IL19940110431 申请日期 1994.07.25
申请人 MICROCOMPONENTS AND SYSTEMS LTD. 发明人 SHIMON NEFTIN
分类号 H01L21/48;H01L23/538;H05K3/02 主分类号 H01L21/48
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