SCANNING EXPOSURE APPARATUS, PREPARATION METHOD OF DEVICE USING THE APPARATUS AND SCANNING EXPOSURE METHOD

摘要

PURPOSE: A scanning exposure apparatus, its method and a method for preparing a device by using the exposure apparatus are provided, to allow the exposed surface of a photosensitive substrate to be put in high precision and high speed to the reference surface by focusing and leveling of high precision. CONSTITUTION: The scanning exposure apparatus exposes a second body by moving a second body to the exposure beam passed through a projection system with the synchronized moving of a first body to an exposure beam; and comprises a measuring means which measures the position information of the second body to the optical axis direction of the projection system during the movement of the second body at a plurality of measuring marks positioned apart to the direction crossing the moving direction of the second body, and an adjusting means which adjusts the slope relation between the upper face of the projection system and the second body to the direction crossing the moving direction of the second body based on the measured result.