发明名称 PROCESS OF PRODUCING HIGH PURITY SILICA GLASS UTILIZING SOL-GEL METHOD
摘要 PROBLEM TO BE SOLVED: To provide a process to produce high purity silica glass utilizing sol-gel method whereby large size silica glass can be produced while suppressing most of cracks in the course of drying with improved formability. SOLUTION: This process comprises a first step of preparing mixed aqueous solution by mixing monomers with dimers in the deionized water, a second step of mixing fumed silica and a dispersion agent with the above mixed aqueous solution, a third step of dispersion to form a sol by agitating the above mixture, a forth step of aging in which bubbles contained in the sol are removed by aging the sol from the dispersion step at the room temperature, and a fifth step of adding a polymerization initiator and a gelation agent.
申请公布号 JP2001213627(A) 申请公布日期 2001.08.07
申请号 JP20000379427 申请日期 2000.12.13
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 OH JEONG-HYUN;LEE MI-KYUNG
分类号 C01B33/141;C03B8/02;C03B19/12;C03B20/00;C03C1/00;C03C3/06;(IPC1-7):C03B8/02 主分类号 C01B33/141
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