发明名称 |
PROCESS OF PRODUCING HIGH PURITY SILICA GLASS UTILIZING SOL-GEL METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a process to produce high purity silica glass utilizing sol-gel method whereby large size silica glass can be produced while suppressing most of cracks in the course of drying with improved formability. SOLUTION: This process comprises a first step of preparing mixed aqueous solution by mixing monomers with dimers in the deionized water, a second step of mixing fumed silica and a dispersion agent with the above mixed aqueous solution, a third step of dispersion to form a sol by agitating the above mixture, a forth step of aging in which bubbles contained in the sol are removed by aging the sol from the dispersion step at the room temperature, and a fifth step of adding a polymerization initiator and a gelation agent.
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申请公布号 |
JP2001213627(A) |
申请公布日期 |
2001.08.07 |
申请号 |
JP20000379427 |
申请日期 |
2000.12.13 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
OH JEONG-HYUN;LEE MI-KYUNG |
分类号 |
C01B33/141;C03B8/02;C03B19/12;C03B20/00;C03C1/00;C03C3/06;(IPC1-7):C03B8/02 |
主分类号 |
C01B33/141 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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