发明名称 PROCESS OF PRODUCING HIGH PURITY SILICA GLASS UTILIZING SOL-GEL METHOD
摘要 PROBLEM TO BE SOLVED: To provide a process to produce high purity silica glass utilizing sol-gel method whereby rod shaped silica glass with improve formability can be produced while suppressing most of cracks in the occurs of drying even a fluorine compound is added. SOLUTION: This process comprises a preparation step 100 of preparing mixed aqueous solution by mixing a fluorine compound and a dispersion agent in the deionized water, a mixing step 200 of mixing fumed silica with the above mixed aqueous solution, a dispersion step 300 of agitating the above mixture to form a sol, an aging step 400 of aging the sol at the ambient temperature to stabilize silica particles, and a defoaming step 500 of removing bubbles contained in the sol and adding a gelation agent.
申请公布号 JP2001213628(A) 申请公布日期 2001.08.07
申请号 JP20000387819 申请日期 2000.12.20
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 OH JEONG-HYUN;LEE MI-KYUNG
分类号 B01D19/00;C01B33/18;C03B8/02;C03B19/12;C03B20/00;C03C1/00;(IPC1-7):C03B8/02 主分类号 B01D19/00
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