发明名称 Porous materials
摘要 Porous organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming integrated circuits containing such porous organo polysilica dielectric materials.
申请公布号 US6271273(B1) 申请公布日期 2001.08.07
申请号 US20000685750 申请日期 2000.10.10
申请人 SHIPLEY COMPANY, L.L.C. 发明人 YOU YUJIAN;LAMOLA ANGELO A.;GORE ROBERT H.;GALLAGHER MICHAEL K.;ANNAN NIKOI
分类号 C08J9/22;C08J9/26;H01B3/46;H01L21/316;(IPC1-7):C08J9/26 主分类号 C08J9/22
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