发明名称 |
Projection exposure apparatus and method |
摘要 |
An exposure apparatus for projecting an image of a plate onto a substrate to be exposed through a projection optical system. The apparatus includes a device for measuring an elongation of the plate in accordance with the detection of a reference mark of the projection optical system and a device for controlling a magnification of the projection optical system in accordance with the measured elongation.
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申请公布号 |
US6271910(B1) |
申请公布日期 |
2001.08.07 |
申请号 |
US19970914880 |
申请日期 |
1997.08.20 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
UZAWA SHIGEYUKI |
分类号 |
G03F9/00;G03F7/20;H01L21/027;(IPC1-7):G03B27/52;G03B27/42;G01B11/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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