| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a system arranging a thin-film electron source in a plural pieces in a matrix form, making an electron beam, having an arbitrary configuration irradiate by controlling the electron irradiation of the each electron emission parts, keeping minute workability, which the electron beam drawing has in an electron beam drawing system which projects image on a sample with a projection optical system, and trying to shorten the drawing time to improve the throughput. SOLUTION: The method and the system include reducing drawing time for satisfying the required drawing accuracy, by adjusting a drive voltage and drive time which spreading of a thin-film electronic source 1 depending on the required drawing accuracy revising the proximity effect by adjusting a drive time spreading, so that the energy piled in a pattern drawn becomes uniform simultaneously. The drawing time was reduced while keeping the required drawing accuracy. The proximity effect can be corrected efficiently.
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