| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce an equipment cost and the workload accompanying a change in a substrate size and to save spaces by making it possible to continuously process respective stages of developing, etching and peeling with one device. SOLUTION: This device has a substrate supporting base 4 which is freely rotatably mounted in a processing tank 3, an electric motor 6 which is connected through a revolving shaft 5 to the substrate supporting base, a developer nozzle 21 which is disposed in the upper part of the processing tank, an etchant nozzle 22 and a peeling liquid nozzle 23. Washing liquid is injected from the respective nozzles after the end of the respective stages for developing, etching and peeling.</p> |
