| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive resist composition excellent in adhesiveness to a substrate and dry etching resistance and having various good resist performances such as resolution and sensitivity. SOLUTION: The chemical amplification type positive type resist composition contains an alkali-insoluble or slightly alkali-soluble resin having polymerization units of formulae I and II (where R1 is H or methyl; R2 and R3 are each a 1-4C alkyl; R4 and R5 are each H, hydroxyl or alkyl; R6 and R7 are each H, a 1-3C alkyl, a 1-3C hydroxyalkyl, carboxyl, cyano or -OCOR8 (R8 is an alcohol residue) or bond to each other to form a carboxylic acid anhydride residue of the formula -C(=O)OC(=O)-) and a polymerization unit of maleic anhydride or itaconic anhydride and convertible to an alkali-soluble resin by the action of an acid and an acid generating agent. |
