发明名称 METHOD OF AND APPARATUS FOR DETERMINING SUBSTRATE OFFSET USING OPTIMIZATION TECHNIQUE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of and an apparatus for wafer alignment that operate, without having to increase the transfer period of a wafer, while the wafer is being transferred. SOLUTION: Dynamic alignment of a wafer, which uses a support blade for transferring the wafer, is provided by determining the approximate value of an offset of the wafer, with respect to a desirable position of the wafer is a module. The determination is, in terms of the statement of an optimization program for effectively keeping an offset computation time period within a wafer transfer time period. According to this method, and by programming a computer, the wafer is picked up using an end effector from a first location, so that the end effector is moved to transfer the picked up wafer from the first location past a set of sensors to produce sensor data.</p>
申请公布号 JP2001210698(A) 申请公布日期 2001.08.03
申请号 JP20000355734 申请日期 2000.11.22
申请人 LAM RES CORP 发明人 MOORING BENJAMIN W
分类号 B25J9/06;G05B19/401;G05B19/408;H01L21/302;H01L21/3065;H01L21/68;(IPC1-7):H01L21/68 主分类号 B25J9/06
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