| 摘要 |
PROBLEM TO BE SOLVED: To enable a substrate-processing apparatus to be lessened in occupancy area in a clan room. SOLUTION: A substrate-processing apparatus body is equipped with a case 20, in which a cassette stage 1 is provided at its fore part, and a vertical reaction furnace 10 is provided above its hind part. A cassette loader 2, cassette shelves 3 and 4, and a wafer transfer device 5 are provided on the hind side of the cassette stage 1, a boat elevator 8 is provided below the reaction furnace 10, and utility units such as a gas feed unit 11, a power supply unit 12, a control unit 13, an exhaust unit and the like are provided integrally to the case 20. |
