| 摘要 |
PROBLEM TO BE SOLVED: To provide a mark-detecting apparatus and a mark-detecting method, which can precisely specify a mark to be detected and can detect information on the position of the marking with high accuracy, even if there are several marks in a detective scope, to provide an aligner and an exposure method for checking the position of an object with information of the mark position provided by the aligner and the method for detecting, and to provide a device manufactured using the aligner and exposure method, and a method for manufacturing the device. SOLUTION: An apparatus comprises a template data storage part 51 for storing a surrounding template data, including an image of a mark to be detected which was formed on a wafer and an surrounding image of this mark, an image sensor 40 which picks up the image of the top of the wafer, and a data processing part 54 which compares a real image data picked up by an image sensor 40 with peripheral template data.
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