发明名称 |
MULTILEVEL FLUSH EEPROM CELL AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a multilevel flush EEPROM cell whose operation time can be shortened when programming and also provide a method of manufacturing the same. SOLUTION: The EEPROM cell comprises a floating gate 3 which is so formed as to be electrically isolated from a silicon substrate 1 by means of a tunnel oxide film 2 formed on the lower face of the floating gate 3, a first dielectric film 4 which is formed on the upper face of the floating gate 3, a first control gate 5 which is electrically isolated from the floating gate 3 by means of the first dielectric film 4 and which is formed on the upper face of the first dielectric film 4, a second dielectric film 6 formed on the side face and upper face of the first control gate 5, a second control gate 7 which is electrically isolated from the first control gate 5 by means of the second dielectric film 6 and which is formed on the side face and upper face of the second dielectric film 6, and a source and drain formed by a self-alignment process at the edges of the second control gate 7.
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申请公布号 |
JP2001210733(A) |
申请公布日期 |
2001.08.03 |
申请号 |
JP20000390367 |
申请日期 |
2000.12.22 |
申请人 |
HYUNDAI ELECTRONICS IND CO LTD |
发明人 |
SANG-HUAN CHANG;KIN KISHAKU;RI KONU;BOKU SEIKI |
分类号 |
H01L21/8247;G11C11/56;G11C16/04;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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