发明名称 FIELD-EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To form a source and a drain, which are respectively formed on the upper and lower gate electrodes of an field-effect transistor, in a state, where the source and drain are aligned with each other to minimize parasitic capacitance which impairs high-speed operation of the field-effect transistor. SOLUTION: A field-effect transistor is constituted of a second support substrate, a lower gate embedded in an insulator formed on the second support substrate, an insulating layer formed on the lower gate, a semiconductor layer formed on the insulating layer, an insulation layer formed on the semiconductor layer, an upper gate formed on the insulation layer, source and drain electrodes separated from each other by the insulation layer, an upper gate electrode and a lower gate electrode.
申请公布号 JP2001210827(A) 申请公布日期 2001.08.03
申请号 JP20000020045 申请日期 2000.01.28
申请人 NATL INST OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY METI;MAEDA TATSURO 发明人 MAEDA TATSURO
分类号 H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/336
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