发明名称 PRODUCTION METHOD OF SURFACE ACOUSTIC WAVE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a production method of surface acoustic wave device which is capable of adjusting frequency accurately. SOLUTION: The method comprises a first step where an IDT electrode 4 and a connecting electrode 5 are formed on a piezoelectric substrate 3 to provide surface acoustic wave device 6, a second step where the frequency response of the surface acoustic wave device 6 is then measured, a third step where the surface acoustic wave device 6 is then destaticized, and a fourth step where the surface acoustic wave device 6 is subsequently adjusted in accordance with the result of the measurement in the second step, and since the surface acoustic wave device 6 is hardly charged with electricity, above purpose can be achieved.
申请公布号 JP2001211046(A) 申请公布日期 2001.08.03
申请号 JP20000015310 申请日期 2000.01.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MATSUI ATSUSHI
分类号 H03H3/10;(IPC1-7):H03H3/10 主分类号 H03H3/10
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