发明名称 Use of oxide surface to facilitate gate break on a carrier substrate for a semiconductor device
摘要 An encapsulant molding technique used in chip-on-board encapsulation wherein an oxidizable metal layer is patterned on a substrate and the oxidizable metal layer is oxidized to facilitate removal of unwanted encapsulant material. The oxidizable metal layer which adheres to the substrate is applied over a specific portion of the substrate. The oxidizable metal layer is oxidized to form a metal oxide layer which does not adhere to encapsulant materials.
申请公布号 US2001010409(A1) 申请公布日期 2001.08.02
申请号 US20010810293 申请日期 2001.03.16
申请人 WENSEL RICHARD W. 发明人 WENSEL RICHARD W.
分类号 H01L21/56;H01L23/31;(IPC1-7):H01L21/322;H01L23/28;H01L23/48;H01L23/52;H01L29/40 主分类号 H01L21/56
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