| 摘要 |
PURPOSE: A resist remover composition is provided to improve the time required for removing resist film deteriorated by metallic byproducts, and minimize corrosion of metallic wires, especially copper wires, and to enhance facility in rinsing by using water only. CONSTITUTION: A resist remover composition is comprised of 10 to 40 wt.% of water-soluble organic amine compound, 40 to 70 wt.% of water-soluble organic solvent, 10 to 30 wt.% of water, 5 to 15 wt.% of organic phenol compound (formula 1) having two or three hydroxyl group, 0.5 to 5 wt.% of anionic compound having a perfluoroalkyl functional group, and 0.01 to 1 wt.% of polyoxy ethylene alkylamine ether surfactant. The water-soluble organic amine compound is preferably amino alcohol compound, and the water-soluble organic solvent is selected from a group consisting of dimethylsulfoxide, N-methyl pyrrolidine, dimethyl acetamide, and dimethyl formamide. |
