| 摘要 |
PURPOSE: A resist remover composition is provided to improve the time required for removing resist film deteriorated by metallic byproducts, minimize corrosion of metallic wires and side fitting, and prevent the surface of a substrate from being redeposited by resist dissolved in the remover. CONSTITUTION: A resist remover composition is comprised of 10 to 40 wt.% of water-soluble organic amine compound, 10 to 60 wt.% of water-soluble polarized organic solvent, 10 to 30 wt.% of water, and 0.1 to 10 wt.% of organic phenol compound (formula 1-5) having at least two hydroxyl groups. The water-soluble organic amine compound is preferably amino alcohol compound, and the water-soluble polarized organic solvent is selected from a group consisting of dimethylsulfoxide, N-methyl pyrrolidine, dimethyl acetamide, dimethyl formamide, dimethyl imidazolidone and aliphatic carboxylic acid ester. |
