VERTICAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A vertical diffusion furnace for manufacturing a semiconductor device is provided to prevent a boat from shaking on a boat cap by directly coupling the boat with the boat cap. CONSTITUTION: When a boat(80) is unloaded in a reaction tube(60), a wafer(70) is carried in a slot(83a) of the boat(80). The boat(80) is loaded in the reaction tube(60) by an elevation device(55). If gas is supplied from the external gas supply, the gas is supplied to the reaction tube(60) via a coupler(95), a supply line(91), a protrusion tube, an inserting groove, a chimney(85a), a guide line(85b) and a deflator(85c). The deflator(85c) is formed in the side of the wafer(70) and between the wafer(70) and the wafer(70), so that a constant amount of gas is supplied to each wafer(70).