发明名称 PLATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a plating device with which increase in the volume of a plating liquid replenished to a plating tank is prevented and the cost of treating the waste plating liquid is reduced. SOLUTION: This plating device is provided with a plating tank 10 storing a plating liquid 1 and wherein an article to be plated is dipped and electroplated by an anode and a cathode, a control means 16 for controlling the plating of the article, a concentration detecting means 14 driven by the control means 16 and detecting the concentration of a plating component in the plating liquid 1 consumed by the plating in the tank 10, a replenishing means 18 for dissolving and adding a plating material 2 as the plating component directly to the plating liquid 1 in the tank 10 in accordance with the detection result of the means 14 under the control of the means 16 and a circulating means 12 driven by the control means 16, circulating the plating liquid 1 in the tank 10 and mixing the plating material 2 added by the replenishing means 18 and the plating liquid 1.
申请公布号 JP2001207298(A) 申请公布日期 2001.07.31
申请号 JP20000015102 申请日期 2000.01.24
申请人 SHIMADA PHYS & CHEM IND CO LTD 发明人 OTSUBO TETSURO;NOBATA HIROYOSHI;TACHIHABA YOSHITO;SONODA HARUKI;MORITO TAISHIN
分类号 C23C18/00;C25D21/14;(IPC1-7):C25D21/14 主分类号 C23C18/00
代理机构 代理人
主权项
地址