ROTATING MAGNET, AND INLINE TYPE SPUTTERING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a rotating magnet capable of producing, even if the conventional permanent magnet is used, a ferromagnetic field equal to or higher than that of the conventional one and also capable of removing the noneroded area of a target and improving the efficiency of material utilization and also to provide an inline type sputtering system equipped with this rotating target. SOLUTION: The rotating magnet is constituted of a first magnet 2 and a second magnet 3; these are worked respectively into the figure of near 8, in the shape of a plane facing a target. The inline type sputtering system is integrated with this rotating magnet.