| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method capable of uniformizing the film thickness, magnetic properties and film characteristics of a GMR film and also capable of manufacturing the GMR film having excellent characteristics at a low cost in high yield, and a manufacturing system therefor. SOLUTION: Film deposition is performed by regulating the positional relationship between a target 1 and a substrate as an object of GMR film deposition provided to the position facing the target 1 in such a way as to locate them in the optimum positions according to the kind of film deposition materials to attain the characteristics required of respective thin film layers. In the case of deposition of a conductive layer, the substrate and the target are located so that the center line of the substrate is shifted with respect to the center line of the target and also sputter deposition is performed while rotating the substrate to uniformize film thickness. Further, in the case of deposition of a thin film composed of a plurality of elements, a plurality of targets, each composed of a single element constituting a composite material, are disposed and the distance between the substrate and each target is made adjustable or the electric power to be applied to each target is controlled, by which the control of a composition with high precision is made possible and a thin film with a composition uniform over the whole region of the substrate can be obtained.
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