发明名称 Apparatus and methods for substantial planarization of solder bumps
摘要 Apparatus and methods for substantial planarization of solder bumps. In one embodiment, an apparatus includes a planarization member engageable with at least some of the plurality of outer surfaces to apply a planarization action on one or more of the outer surfaces to substantially planarize the plurality of outer surfaces, and a securing element to securely position the bumped device during engagement with the planarization member. Through application of "additive" and/or "subtractive" processes, the solder balls are substantially planarized. In alternate embodiments, the planarization member includes a cutting tool and the planarization action comprises a milling action; or the planarization member includes a heated platen and the planarization action comprises a thermo-mechanical deformation action; or the planarization member includes an abrasive surface and the planarization action comprises a grinding action; or the planarization member includes a chemical solution and the planarization action comprises a chemical reaction; or the planarization member includes a solder deposition device and the planarization action comprises a solder. In a further embodiment, an apparatus includes a load device to urge the at least some outer surfaces of the bumped device into engagement with the planarization member.
申请公布号 US6267650(B1) 申请公布日期 2001.07.31
申请号 US19990370498 申请日期 1999.08.09
申请人 MICRON TECHNOLOGY, INC. 发明人 HEMBREE DAVID R.
分类号 B24B7/22;B24B37/04;H01L21/48;H01L21/60;H01L21/66;H05K3/34;(IPC1-7):B24B1/00 主分类号 B24B7/22
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