| 摘要 |
PROBLEM TO BE SOLVED: To provide an electroforming device by which an electroformed film is almost uniformly formed on the surface of a work such as a glass substrate. SOLUTION: In this electroforming device 100, a plating tank 120 for storing plating solution, a cathode 150 and an anode 130 opposed in the plating tank at a specified interpolar distance, a work to be electroformed arranged on the cathode and a shielding part on the work are provided. In this case, a gap for preventing the retention of plating solution is formed between the work 140 and shielding part 200 in this electroforming device 100.
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