FILM DEPOSITION METHOD AND FILM DEPOSITION SYSTEM

摘要

PROBLEM TO BE SOLVED: To improve the optical characteristics such as density, adhesive strength and absorption of an optical thin film deposited on a substrate under no-heating or low temperature by a vacuum deposition method. SOLUTION: MgF2 granules are charged to a crucible as an evaporation source 2 and are heated and evaporated by an electron gun 3 to deposit a metallic fluoride thin film on the object 9 to be treated as a substrate. Since a dense film with low absorption and tight adhesion cannot be obtained in the case the object 9 to be treated lies under no-heating or low temperature, the object 9 to be treated in the process of the film deposition is irradiated with neutral grains and negative ions generated by magnetron sputtering in which high frequency is applied on a target 4 as assists.