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发明名称
METHOD FOR FORMING SILICIDE REGIONS ON AN INTEGRATED DEVICE
摘要
申请公布号
KR20010072876(A)
申请公布日期
2001.07.31
申请号
KR1020017002281
申请日期
2001.02.22
申请人
发明人
分类号
H01L21/24
主分类号
H01L21/24
代理机构
代理人
主权项
地址
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