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经营范围
发明名称
OZONE TREATMENT DEVICE OF SEMICONDUCTOR PROCESS SYSTEM
摘要
申请公布号
KR20010071982(A)
申请公布日期
2001.07.31
申请号
KR1020017000818
申请日期
2001.01.19
申请人
发明人
分类号
H01L21/00
主分类号
H01L21/00
代理机构
代理人
主权项
地址
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