| 摘要 |
PURPOSE: To provide a substrate treating device capable of uniformly supplying a treating liquid on the surface of a substrate without affecting the physical properties of a treating liquid and damaging the substrate in the substrate treatment such as development processing. CONSTITUTION: In the substrate treating device for treating the surface of the substrate with the treating liquid, the substrate 1 is horizontally arranged, a rotary blade 2 is oppositely arranged above the substrate 1, the treating liquid is supplied to the surface of the substrate 1, the rotary blade 2 is rotated in non-contact state with the treating liquid to generate air flow 6 and a treating liquid group 5 having circulating flow inside is formed below the rotary blade 2 and on the surface of the substrate by the air flow 6.
|
