| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high sensitivity positive type radiation sensitive composition having resolution for attaining sub-quarter micron patterning. SOLUTION: The positive type radiation sensitive composition contains (a) a polymer comprising repeating units having a structure, which forms an alkali- soluble group under the action of an acid and a crosslinkable part and (b) an acid generating agent, which generates acid when irradiated. The crosslinkable part in the polymer (a) is a structure of formula (where X is halogen or cyano group; and Y is a 1-20C organic group). A resist pattern is produced using the composition. |
