| 摘要 |
PROBLEM TO BE SOLVED: To easily change respective temperature conditions and gas conditions and faithfully reproduce reaction in wafer condition. SOLUTION: A sample holder 10 for an electron microscope, with a bulk sample 2 set in place, is inserted into a sample chamber 14 in a pyrognostics chamber. A gas is then introduced into the chamber to heat the holder with IR light 19 from a temperature controller. After heating, the holder 10 for the electron microscope with the sample 2 left in place is then set in a convergence charged particle beam apparatus to irradiate the sample with a Ga charged particle beam 21 for slicing purposes. After slicing, the holder 10 for the electron microscope with the sample 2 set in place is then set in a transmission electron microscope, to allow an electron beam 22 to pass through the sample for observing state reaction. In this way, observation under the electron after bulk sample 2 heating followed by sample 2 slicing enables a faithful reproduction of actual heating reaction in wafer state. It also facilitates alterable conditions for introduced an gas and heating temperatures for the sample 2 in the sample chamber 14.
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