发明名称 METHOD FOR COMPOSING PATTERN
摘要 PROBLEM TO BE SOLVED: To accurately compose master pattern. SOLUTION: When a pattern to be measured preliminarily decided as non- defective is divided into a plurality of photographing areas in accordance with the visual field of a camera and a master pattern is prepared from an image obtained by photographing each photographing area with the camera while changing the relative position of the camera and the pattern to be measured, imaging is performed so as to generate an overlapping area in adjacent imaging areas (step 101). The correlation value of each overlapping part is calculated in the images of two adjacent imaging areas, the positional deviation quantity between the images of the two imaging areas is calculated from a peak position having the highest correlation value and the two images are composed on the basis of the positional deviation quantity (step 104). Thus, a master pattern corresponding to the entire pattern to be measured is prepared.
申请公布号 JP2001202520(A) 申请公布日期 2001.07.27
申请号 JP20000013746 申请日期 2000.01.24
申请人 NIPPON AVIONICS CO LTD 发明人 IDA TORU
分类号 G01N21/956;G06T1/00;G06T7/00 主分类号 G01N21/956
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