发明名称 PLASMA GENERATOR AND PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To obtain desire plasma distribution in microwave discharge using a slot antenna without the restriction on the position of the slot antenna. SOLUTION: The plasma generator is installed with a wave guide 11 to transmit microwave, a wave guide 12 for radiation on which multiple slot antennas are formed, and a discharge chamber 30 to constitute to receive electromagnetic radiation from the slot antennas 13 via a dielectric window 13, in which the size of the wave guide 12 for radiation is changed locally in the vicinity of the slot antennas 13 so that the wavelength of the microwave in the wave guide 12 for radiation is changed locally to enable to control the strength distribution of the electromagnetic radiation from the sot antennas 13 toward the discharge chamber 30.
申请公布号 JP2001203099(A) 申请公布日期 2001.07.27
申请号 JP20000012269 申请日期 2000.01.20
申请人 YAC CO LTD 发明人 NOGUCHI TAKESHI
分类号 H01L21/302;H01J37/32;H01L21/205;H01L21/3065;H01L21/31;H05H1/46 主分类号 H01L21/302
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