| 摘要 |
PROBLEM TO BE SOLVED: To provide a base for a heat developable photosensitive material superior in various physical properties, such as creep deformation, surface roughness, thermal dimensional stability, planeness and scuffing resistance, a method for producing the base and a heat developable photosensitive material. SOLUTION: An undercoat layer is formed on a polyester, film before the completion of crystal orientation by applying and drying an aqueous coating solution containing a resin having 40 deg.C or higher glass transition temperature and inorganic particles, and after stretching, heat fixation and relaxation treatment, the polyester film is heat-treated under conveyance under the conditions of a temperature Tp ( deg.C), a tension Ts (kg/cm2) and a time Tm (min) which satisfy expression (1) 6.0<=Q<=7.4 (Q=(Tp/25)+log(Tm)) and expression (2) 1.8<=(Q/Ts)<=5.0 to produce the objective base for a heat developable photosensitive material.
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