发明名称 HYDROGEN ANNEALING METHOD AND ITS DEVICE
摘要 PROBLEM TO BE SOLVED: To realize a reduced-pressure annealing device as well as perform both reduced-pressure hydrogen annealing and atmospheric pressure hydrogen annealing in the same hydrogen annealing device. SOLUTION: This hydrogen annealing device is provided with a reaction chamber 2, a hydrogen gas introduction line 18 for introducing a hydrogen gas into the reaction chamber, and an atmospheric pressure exhaust line 9 and a reduced-pressure exhaust line 5 which are connected with the reaction chamber. The exhaust lines are changed over to select the reduced-pressure hydrogen annealing or atmospheric pressure hydrogen annealing, and a necessary treatment method is selected in accordance with an object to be treated such as a device necessary for being reduced, a device necessary for removal of impurities, etc., thus improving the quality of products.
申请公布号 JP2001203211(A) 申请公布日期 2001.07.27
申请号 JP20000012146 申请日期 2000.01.20
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 TAKAKUWA YASUNORI;TOMEZUKA KOJI
分类号 H01L21/3205;C21D1/76;C21D1/773;H01L21/321;H01L21/324;H01L23/52;(IPC1-7):H01L21/324;H01L21/320 主分类号 H01L21/3205
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