COLUMN FOR A CHARGED PARTICLE BEAM DEVICE

摘要

The invention provides an improved column for a charged particle beam device. The column comprises deflectors for scanning the beam over the specimen, for aligning the beam with regard to the objective and for compensating aberrations caused by the objective. Thereby, the total number of electrode arrangements and/or coil arrangements that are used for the deflectors and that are independently controllable, is 8 or less.