发明名称 PRINTING OF POLISHING PADS
摘要 <p>A polishing pad includes a flexible substrate (5) and a polymeric polishing layer (11) that has a repeatable pattern of polymeric asperities that are manufactured by printing, according to a gravure printing process or a screen printing process.</p>
申请公布号 WO2001053040(A1) 申请公布日期 2001.07.26
申请号 US2001001809 申请日期 2001.01.19
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