| 摘要 |
<p>Disclosed are antimicrobial cleansing compositions that have a pH of from about 2.0 to about 5.5 and comprise an antimicrobial agent, an amphoteric surfactant, and 2-pyrrolidone-5 carboxylic acid as a proton donating agent. Also disclosed are corresponding articles of manufacture and methods of cleansing the skin using the described compositions. The compositions are mild to the skin and provide improved antimicrobial benefits to the skin.</p> |
