| 发明名称 |
SPUTTER CHAMBER AND VACUUM TRANSPORT CHAMBER AND VACUUM TREATMENT INSTALLATIONS WITH CHAMBERS OF THIS TYPE |
| 摘要 |
A substrate support (5) is mounted in a sputter chamber in such a way that said support can be driven in rotation about an axis (A). A magnetron source is mounted in the sputter chamber with a central axis (Z) inclined ( beta ) towards the axis of rotation of the substrate support (5). |
| 申请公布号 |
WO0153561(A1) |
申请公布日期 |
2001.07.26 |
| 申请号 |
WO2001CH00020 |
申请日期 |
2001.01.12 |
| 申请人 |
UNAXIS BALZERS AG;DUBS, MARTIN;SCHERTLER, ROMAN |
发明人 |
DUBS, MARTIN;SCHERTLER, ROMAN |
| 分类号 |
C23C14/22;C23C14/35;C23C14/56;G11B7/26 |
主分类号 |
C23C14/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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