METHOD FOR CALIBRATION OF AN ELECTRICAL LINEWIDTH MEASUREMENT SYSTEM, WAFER FOR BEING USED IN THE METHOD, AND ELECTRICAL LINEWIDTH MEASUREMENT CALIBRATION SYSTEM

摘要

The calibration structure and wafer (300) includes a first straight line structure (501) having a first width, a second straight line structure (502) having a second width and third line structure (503) comprising a first line portion having the first width and a second line portion having the second width. By measuring the electrical resistance and using Ohm's law the line structures, the actual line widths are determined and the electrical linewidth measurement system is calibrated.