| 摘要 |
A system for abating fluorocompound, e.g., fluorine or gaseous fluorine-containing compounds, in an effluent gas stream containing same, by scrubbing of the effluent gas stream with an aqueous scrubbing medium in the presence of a reducing agent, e.g., sodium thiosulfate, ammonium hydroxide, or potassium iodide. The abatement system of the invention has utility in the treatment of semiconductor manufacturing process effluents containing fluorine and/or fluorocarbon gas species.
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