发明名称 Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter
摘要 The projection lens has at least 5 different lens groups (G1-G5), each provided with a number of lens surfaces, at least 2 of the lens surfaces lying adjacent one another for providing a double aspherical lens (21), which is positioned at a minimum distance from the image plane (0') of greater than the maximum lens diameter.
申请公布号 DE10002626(A1) 申请公布日期 2001.07.26
申请号 DE20001002626 申请日期 2000.01.22
申请人 CARL ZEISS 发明人 SCHUSTER, KARL-HEINZ
分类号 G02B13/14;G02B13/18;G02B17/08;G03F7/20;(IPC1-7):G02B17/08;G02B1/02;G02B21/04 主分类号 G02B13/14
代理机构 代理人
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