发明名称 |
Circuit for measuring capacitances of structures in an IC enables voltage-dependent, differential capacitance measurement - has test and reference structures connected to junctions of series transistors in parallel circuits connected between poles of controllable voltage supply |
摘要 |
The circuit has a test structure (10) and a reference structure (20). Two series circuits (S1,S2) each contains two transistors (T1,T2;T3,T4) with their controlled paths in series and they are connected in parallel between connections (1,2,8) of a controllable voltage supply (9). A test structure connection is connected to the junction of the transistor sin the first series circuit. A connection for the reference structure is connected to the transistor junction in the second series circuit.
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申请公布号 |
DE10001129(A1) |
申请公布日期 |
2001.07.26 |
申请号 |
DE20001001129 |
申请日期 |
2000.01.13 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
LINDOLF, JUERGEN;SCHATT, STEFANIE |
分类号 |
G01R27/26;G01R31/28;(IPC1-7):G01R31/28;H01L21/66 |
主分类号 |
G01R27/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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