发明名称 Circuit for measuring capacitances of structures in an IC enables voltage-dependent, differential capacitance measurement - has test and reference structures connected to junctions of series transistors in parallel circuits connected between poles of controllable voltage supply
摘要 The circuit has a test structure (10) and a reference structure (20). Two series circuits (S1,S2) each contains two transistors (T1,T2;T3,T4) with their controlled paths in series and they are connected in parallel between connections (1,2,8) of a controllable voltage supply (9). A test structure connection is connected to the junction of the transistor sin the first series circuit. A connection for the reference structure is connected to the transistor junction in the second series circuit.
申请公布号 DE10001129(A1) 申请公布日期 2001.07.26
申请号 DE20001001129 申请日期 2000.01.13
申请人 INFINEON TECHNOLOGIES AG 发明人 LINDOLF, JUERGEN;SCHATT, STEFANIE
分类号 G01R27/26;G01R31/28;(IPC1-7):G01R31/28;H01L21/66 主分类号 G01R27/26
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