发明名称 PLASMA TREATMENT DEVICE
摘要 PURPOSE: To assemble a vacuum vessel with ease and to reduce pressure until obtaining high vacuum by decreasing a seal structure in a deforming magnetron high frequency discharge type plasma treatment device. CONSTITUTION: A vacuum vessel 21 generating plasma is constituted by an upper vessel 22 of a dome type integrated structure without a seam in a body thereof, and a lower vessel 23 that closes a lower opening part 24 of the dome type upper vessel 22 with a seal member in between. The vacuum vessel 21 is provided with a suction port 26 for taking gas therein, and an exhaust port 34 for evacuating it. An electrode 29 to which high frequency power is applied to ionize gas is provided outside, not inside, of the vacuum vessel 21 into a cylindrical shape. Further, a pair of annular magnets 30 that form lines of magnetic force orthogonal to an electric field are placed outside of the cylindrical electrode 29.
申请公布号 KR20010070484(A) 申请公布日期 2001.07.25
申请号 KR20010001273 申请日期 2001.01.10
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 OKAWA UNRYU;SATO TAKAYUKI
分类号 C23C16/509;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):H01L21/205 主分类号 C23C16/509
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