发明名称 Wafer holder for semiconductor manufacturing apparatus
摘要 <p>A wafer holder (10) is configured of a pair of ceramic base members (4) and conductive layers (1, 2, 3) each posed between the ceramic base members. The conductive layer (1, 2, 3) has a body (1A, 2A, 3A) facing a wafer (20) and an extraction (1B, 2B, 3B,) extracted from the body for external connection, wherein the body (1A, 2A, 3A) and the extraction (1B, 2B, 3B) are arranged in a single plane. Thus there can be obtained a wafer holder for use with a semiconductor manufacturing apparatus that can reduce such distortion as caused when it is heated and cooled and that can also be readily manufactured.</p>
申请公布号 EP1119026(A2) 申请公布日期 2001.07.25
申请号 EP20010300468 申请日期 2001.01.19
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 KUIBIRA, AKIRA;NAKATA, HIROHIKO
分类号 H01L21/3065;H01L21/00;H01L21/302;C23C14/50;H01L21/205;H01L21/68;H01L21/683;H05B3/18;H05B3/20;H05B3/28;(IPC1-7):H01L21/00 主分类号 H01L21/3065
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