USE OF ALKYLATED POLYAMINE IN PHOTORESIST DEVELOPER

摘要

PURPOSE: Provided is a water-based composition which lowers equilibrium and dynamic surface tension for a photoresist developer and for washing electronics devices. CONSTITUTION: The dialkyl polyamine compound of structure represented by formula(1):R-HN-G-NH-R'C or 2 (where R and R' are each a C5-C8 alkyl; G is a C2-C6 linear or cyclic alkylene which may contain a C1-C4 alkyl substituent; (m) is 2-6; and (n) is 2 or 3) is used by an effective amount as a surfactant.