发明名称 Suspended gas distribution manifold for plasma chamber
摘要 <p>A gas inlet manifold (20, 32) for a plasma chamber (10) having a perforated gas distribution plate (20) suspended by flexible side walls (24). The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber. <IMAGE></p>
申请公布号 EP1118693(A2) 申请公布日期 2001.07.25
申请号 EP20010300380 申请日期 2001.01.17
申请人 APPLIED MATERIALS, INC. 发明人 WHITE, JOHN M.;KELLER, ERNST;BLONIGAN, WENDELL T.
分类号 B01J19/08;C23C16/44;C23C16/455;C23C16/509;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):C23C16/455 主分类号 B01J19/08
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