| 摘要 |
A method and apparatus for performing vapor phase deposition to form a monolayer coating on the surface of an article. A liquid coating reagent is provided in a flow passageway extending into the process chamber. A carrier gas is flowed through the flow passageway to form a gas mixture including a vaporized coating reagent. The gas mixture is directed into the process chamber to contact the article. The vaporized coating reagent is deposited onto the article to form a coating thereon.
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