ABRASIVE MATERIAL, PRODUCTION METHOD THEREOF, AND POLISHING METHOD USING ASME

摘要

PROBLEM TO BE SOLVED: To provide a finely particulate abrasive material which enables a fine surface roughness, a high polishing speed, and a polishing speed with a high reproducibility even in a neutral pH range to be achieved and which is dispersed easily and stably in a medium; a stable slurry abrasive material containing the finely particulate abrasive material; a method for producing the slurry abrasive material; and a polishing method using the slurry abrasive material. SOLUTION: A finely particulate abrasive material is provided which is fine composite particles comprising fine silicon oxide particles and fine cerium oxide particles adhered thereto, the amount of the cerium oxide particles being 5-40 pts.wt. based on 100 pts.wt. silicon oxide particles. A slurry abrasive material using the finely particulate abrasive material, a production method therefor, and a one-step polishing method using the slurry abrasive material are also provided.